12-inch wafer mass production technology
High uniformity with LIET optical system
High energy density control precision
Accurate pulse width control
| Laser Wavelength | 527nm |
| Wafer Size | 12-inch |
| Energy Modulation Accuracy | 5mJ/cm2 |
| Beam Of Uniformity | ≤1% |
| Focal Depth Range | 5mm |
